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Gilmer, D.C.

High Dielectric Constant Materials

Gilmer, D.C. - High Dielectric Constant Materials, e-bok


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ISBN: 9783540264620

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Table of contents

1. The Economic Implications of Moore's Law
G.D. Hutcheson

Part I. Classical Regime for SiO2

2. Brief Notes on the History of Gate Dielectrics in MOS Devices
E. Kooi†, A. Schmitz

3. SiO2 Based MOSFETS: Film Growth and Si—SiO2 Interface Properties
E.A. Irene

4. Oxide Reliability Issues
R. Degraeve

Part II. Transition to Silicon Oxynitrides

5. Gate Dielectric Scaling to 2.0—1.0 nm: SiO2 and Silicon Oxynitride
S.-H. Lo, Y. Taur

6. Optimal Scaling Methodologies and Transistor Performance
T. Skotnicki, F. Boeuf

7. Silicon Oxynitride Gate Dielectric for Reducing Gate Leakage and Boron Penetration Prior to High-k Gate Dielectric Implementation
H.-H. Tseng

Part III. Transition to High-k Gate Dielectrics

8. Alternative Dielectrics for Silicon-Based Transistors: Selection Via Multiple Criteria
J.-P. Maria

9. Materials Issues for High-k Gate Dielectric Selection and Integration
R.M. Wallace, G.D. Wilk

10. Designing Interface Composition and Structure in High Dielectric Constant Gate Stacks
G.N. Parsons

11. Electronic Structure of Alternative High-k Dielectrics
G. Lucovsky, J.L. Whitten

12. Physicochemical Properties of Selected 4d, 5d, and Rare Earth Metals in Silicon
A.A. Istratov, E.R. Weber

13. High-k Gate Dielectric Deposition Technologies
J.P. Chang

14. Issues in Metal Gate Electrode Selection for Bulk CMOS Devices
V. Misra

15. CMOS IC Fabrication Issues for High-k Gate Dielectric and Alternate Electrode Materials
L. Colombo, A.L.P. Rotondaro, M.R. Visokay, J.J. Chambers

16. Characterization and Metrology of Medium Dielectric Constant Gate Dielectric Films
A.C. Diebold, W.W. Chism

17. Electrical Measurement Issues for Alternative Gate Stack Systems
G.A. Brown

18. High-k Gate Dielectric Materials Integrated Circuit Device Design Issues
Y.-Y. Fan, S.P. Mudanai, W. Chen, L.F. Register, S.K. Banerjee

Part IV. Future Directions for Ultimate Scaling Technology Generations

19. High-k Crystalline Gate Dielectrics: A Research Perspective
F.J. Walker, R.A. McKee

20. High-k Crystalline Gate Dielectrics: An IC Manufacturer's Perspective
R. Droopad, K. Eisenbeiser, A.A. Demkov

21. Advanced MOS-Devices
J. Bokor, T.-J. King, J. Hergenrother, J. Bude, D. Muller, T. Skotnicki, S. Monfray, G. Timp


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Nyckelord: SCIENCE / Chemistry / General SCI013000


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