Gilmer, D.C.
High Dielectric Constant Materials
1. The Economic Implications of Moore's Law
G.D. Hutcheson
Part I. Classical Regime for SiO
2. Brief Notes on the History of Gate Dielectrics in MOS Devices
E. Kooi†, A. Schmitz
3. SiO
E.A. Irene
4. Oxide Reliability Issues
R. Degraeve
Part II. Transition to Silicon Oxynitrides
5. Gate Dielectric Scaling to 2.0—1.0 nm: SiO
S.-H. Lo, Y. Taur
6. Optimal Scaling Methodologies and Transistor Performance
T. Skotnicki, F. Boeuf
7. Silicon Oxynitride Gate Dielectric for Reducing Gate Leakage and Boron Penetration Prior to High-k Gate Dielectric Implementation
H.-H. Tseng
Part III. Transition to High-k Gate Dielectrics
8. Alternative Dielectrics for Silicon-Based Transistors: Selection Via Multiple Criteria
J.-P. Maria
9. Materials Issues for High-k Gate Dielectric Selection and Integration
R.M. Wallace, G.D. Wilk
10. Designing Interface Composition and Structure in High Dielectric Constant Gate Stacks
G.N. Parsons
11. Electronic Structure of Alternative High-k Dielectrics
G. Lucovsky, J.L. Whitten
12. Physicochemical Properties of Selected 4d, 5d, and Rare Earth Metals in Silicon
A.A. Istratov, E.R. Weber
13. High-k Gate Dielectric Deposition Technologies
J.P. Chang
14. Issues in Metal Gate Electrode Selection for Bulk CMOS Devices
V. Misra
15. CMOS IC Fabrication Issues for High-k Gate Dielectric and Alternate Electrode Materials
L. Colombo, A.L.P. Rotondaro, M.R. Visokay, J.J. Chambers
16. Characterization and Metrology of Medium Dielectric Constant Gate Dielectric Films
A.C. Diebold, W.W. Chism
17. Electrical Measurement Issues for Alternative Gate Stack Systems
G.A. Brown
18. High-k Gate Dielectric Materials Integrated Circuit Device Design Issues
Y.-Y. Fan, S.P. Mudanai, W. Chen, L.F. Register, S.K. Banerjee
Part IV. Future Directions for Ultimate Scaling Technology Generations
19. High-k Crystalline Gate Dielectrics: A Research Perspective
F.J. Walker, R.A. McKee
20. High-k Crystalline Gate Dielectrics: An IC Manufacturer's Perspective
R. Droopad, K. Eisenbeiser, A.A. Demkov
21. Advanced MOS-Devices
J. Bokor, T.-J. King, J. Hergenrother, J. Bude, D. Muller, T. Skotnicki, S. Monfray, G. Timp
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Nyckelord: SCIENCE / Chemistry / General SCI013000
- Författare
- Gilmer, D.C.
- Huff, H.R.
- Utgivare
- Springer
- Utgivningsår
- 2005
- Språk
- en
- Utgåva
- 1
- Kategori
- Naturvetenskaper
- Format
- E-bok
- eISBN (PDF)
- 9783540264620