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Mahapatra, Souvik

Fundamentals of Bias Temperature Instability in MOS Transistors

Mahapatra, Souvik - Fundamentals of Bias Temperature Instability in MOS Transistors, e-kirja

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Table of contents

1. Introduction: Bias Temperature Instability (BTI) in N and P Channel MOSFETs
Souvik Mahapatra, Nilesh Goel, Subhadeep Mukhopadhyay

2. Characterization Methods for BTI Degradation and Associated Gate Insulator Defects
Souvik Mahapatra, Nilesh Goel, Ankush Chaudhary, Kaustubh Joshi, Subhadeep Mukhopadhyay

3. Physical Mechanism of BTI Degradation—Direct Estimation of Trap Generation and Trapping
Subhadeep Mukhopadhyay, Souvik Mahapatra

4. Physical Mechanism of BTI Degradation—Modeling of Process and Material Dependence
Souvik Mahapatra, Kaustubh Joshi, Subhadeep Mukhopadhyay, Ankush Chaudhary, Nilesh Goel

5. Reaction-Diffusion Model
Ahmad Ehteshamul Islam, Nilesh Goel, Souvik Mahapatra, Muhammad Ashraful Alam

6. Modeling of DC and AC NBTI Degradation and Recovery for SiON and HKMG MOSFETs
Nilesh Goel, Souvik Mahapatra

7. Erratum to: Fundamentals of Bias Temperature Instability in MOS Transistors
Souvik Mahapatra

Avainsanat: Engineering, Circuits and Systems, Electronics and Microelectronics, Instrumentation, Solid State Physics

Toimittaja
Julkaisija
Springer
Julkaisuvuosi
2016
Kieli
en
Painos
1st ed. 2015
Sarja
Springer Series in Advanced Microelectronics
Sivumäärä
16 sivua
Kategoria
Tekniikka, energia, liikenne
Tiedostomuoto
E-kirja
eISBN (PDF)
9788132225089
Painetun ISBN
978-81-322-2507-2

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