Depla, Diederik
Reactive Sputter Deposition
1. Simulation of the Sputtering Process
Tadayoshi Ono, Takahiro Kenmotsu, Tetsuya Muramoto
2. Electron Emission from Surfaces Induced by Slow Ions and Atoms
R. A. Baragiola, Pierfrancesco Riccardi
3. Modeling of the Magnetron Discharge
Annemie Bogaerts, Ivan Kolev, Guy Buyle
4. Modelling of Reactive Sputtering Processes
Sören Berg, Tomas Nyberg, Tomas Kubart
5. Depositing Aluminium Oxide: A Case Study of Reactive Magnetron Sputtering
Diederik Depla, Stijn Mahieu, Roger Gryse
6. Transport of Sputtered Particles Through the Gas Phase
Stijn Mahieu, Koen Aeken, Diederik Depla
7. Energy Deposition at the Substrate in a Magnetron Sputtering System
Samuel D. Ekpe, Steven K. Dew
8. Process Diagnostics
James W. Bradley, Thomas Welzel
9. Optical Plasma Diagnostics During Reactive Magnetron Sputtering
Stephanos Konstantinidis, F. Gaboriau, M. Gaillard, M. Hecq, A. Ricard
10. Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross-Corner and Cross-Magnetron Effect
H. Kupfer, F. Richter
11. Reactively Sputter-Deposited Solid Electrolytes and Their Applications
Pascal Briois, Frédéric Lapostolle, Alain Billard
12. Reactive SputteredWide-Bandgap p-Type Semiconducting Spinel AB
Arghya N. Banerjee, Kalyan K. Chattopadhyay
13. Oxide-Based Electrochromic Materials and Devices Prepared by Magnetron Sputtering
C. G. Granqvist
14. Atomic Assembly of Magnetoresistive Multilayers
Haydn Wadley, Xiaowang Zhou, William H. Butler
Avainsanat: Chemistry, Surfaces and Interfaces, Thin Films, Condensed Matter, Physical Chemistry, Industrial Chemistry/Chemical Engineering
- Tekijä(t)
- Depla, Diederik
- Mahieu, Stijn
- Julkaisija
- Springer
- Julkaisuvuosi
- 2008
- Kieli
- en
- Painos
- 1
- Sarja
- Springer Series in Materials Science
- Sivumäärä
- 588 sivua
- Kategoria
- Eksaktit luonnontieteet
- Tiedostomuoto
- E-kirja
- eISBN (PDF)
- 9783540766643