Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Avainsanat: ald; extensively; practical; foundations; first; book; theory; applications; aspects; fundamental; principles; nanotechnology; edition; layer deposition; new; atomic; sherman; arthur; developments; process configuration, Industrial Engineering / Manufacturing, Nanotechnology Special Topics, Industrial Engineering / Manufacturing, Nanotechnology Special Topics