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Kar, Samares

High Permittivity Gate Dielectric Materials

Kar, Samares - High Permittivity Gate Dielectric Materials, ebook

175,40€

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ISBN: 9783642365355
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Table of contents

1. Introduction to High-k Gate Stacks
Samares Kar

2. MOSFET: Basics, Characteristics, and Characterization
Samares Kar

3. Hafnium-Based Gate Dielectric Materials
Akira Nishiyama

4. Hf-Based High-k Gate Dielectric Processing
Masaaki Niwa

5. Metal Gate Electrodes
Jamie K. Schaeffer

6.
V

FB
/V

TH
Anomaly in High-k Gate Stacks
Akira Toriumi, Toshihide Nabatame

7. Channel Mobility
Chadwin Young

8. Reliability Implications of Fast and Slow Degradation Processes in High-k Gate Stacks
Gennadi Bersuker

9. Lanthanide-Based High-k Gate Dielectric Materials
Daniel J. Lichtenwalner

10. Ternary HfO2 and La2O3 Based High-k Gate Dielectric Films for Advanced CMOS Applications
Akira Toriumi, Koji Kita

11. Crystalline Oxides on Silicon
H. Jörg Osten

12. High Mobility Channels
Michel Houssa, Peide Ye, Marc Heyns

Keywords: Engineering, Electronics and Microelectronics, Instrumentation, Optical and Electronic Materials, Solid State Physics, Spectroscopy and Microscopy, Engineering, general

Author(s)
Publisher
Springer
Publication year
2013
Language
en
Edition
2013
Series
Springer Series in Advanced Microelectronics
Page amount
32 pages
Category
Technology, Energy, Traffic
Format
Ebook
eISBN (PDF)
9783642365355

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