Kar, Samares
High Permittivity Gate Dielectric Materials
1. Introduction to High-k Gate Stacks
Samares Kar
2. MOSFET: Basics, Characteristics, and Characterization
Samares Kar
3. Hafnium-Based Gate Dielectric Materials
Akira Nishiyama
4. Hf-Based High-k Gate Dielectric Processing
Masaaki Niwa
5. Metal Gate Electrodes
Jamie K. Schaeffer
6.
Akira Toriumi, Toshihide Nabatame
7. Channel Mobility
Chadwin Young
8. Reliability Implications of Fast and Slow Degradation Processes in High-k Gate Stacks
Gennadi Bersuker
9. Lanthanide-Based High-k Gate Dielectric Materials
Daniel J. Lichtenwalner
10. Ternary HfO
Akira Toriumi, Koji Kita
11. Crystalline Oxides on Silicon
H. Jörg Osten
12. High Mobility Channels
Michel Houssa, Peide Ye, Marc Heyns
Keywords: Engineering, Electronics and Microelectronics, Instrumentation, Optical and Electronic Materials, Solid State Physics, Spectroscopy and Microscopy, Engineering, general
- Author(s)
- Kar, Samares
- Publisher
- Springer
- Publication year
- 2013
- Language
- en
- Edition
- 2013
- Series
- Springer Series in Advanced Microelectronics
- Page amount
- 32 pages
- Category
- Technology, Energy, Traffic
- Format
- Ebook
- eISBN (PDF)
- 9783642365355