Hofmann, Siegfried
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science
1. Introduction and Outline
Siegfried Hofmann
2. Instrumentation
Siegfried Hofmann
3. Qualitative Analysis (Principle and Spectral Interpretation)
Siegfried Hofmann
4. Quantitative Analysis (Data Evaluation)
Siegfried Hofmann
5. Optimizing Measured Signal Intensity: Emission Angle, Incidence Angle and Surface Roughness
Siegfried Hofmann
6. Optimizing Certainty and the Detection Limit: Signal-to-Noise Ratio
Siegfried Hofmann
7. Quantitative Compositional Depth Profiling
Siegfried Hofmann
8. Practice of Surface and Interface Analysis with AES and XPS
Siegfried Hofmann
9. Typical Applications of AES and XPS
Siegfried Hofmann
10. Surface Analysis Techniques Related to AES and XPS
Siegfried Hofmann
Keywords: Physics, Solid State Physics, Spectroscopy and Microscopy, Surfaces and Interfaces, Thin Films
- Author(s)
- Hofmann, Siegfried
- Publisher
- Springer
- Publication year
- 2013
- Language
- en
- Edition
- 2013
- Series
- Springer Series in Surface Sciences
- Page amount
- 19 pages
- Category
- Natural Sciences
- Format
- Ebook
- eISBN (PDF)
- 9783642273810