Baudrant, Annie
Silicon Technologies: Ion Implantation and Thermal Treatment
| Printing | 30 pages with an additional page accrued every day, capped at 30 pages |
|---|---|
| Copy to clipboard | 5 excerpts |
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Keywords: jeanjacques; oxidation; techniques; overview; various; properties; physical; silica; atomic transport; equations; possible; mechanisms; place; transport; case; thermal; grove; theory, Electronic Materials, Electronic Materials, Electronic Materials, Electronic Materials
- Editor
- Baudrant, Annie
- Publisher
- John Wiley and Sons, Inc.
- Publication year
- 2011
- Language
- en
- Edition
- 1
- Series
- ISTE
- Page amount
- 368 pages
- Category
- Technology, Energy, Traffic
- Format
- Ebook
- eISBN (ePUB)
- 9781118601143
- Printed ISBN
- 9781848212312
