Cameron, David
Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Keywords: ald; extensively; practical; foundations; first; book; theory; applications; aspects; fundamental; principles; nanotechnology; edition; layer deposition; new; atomic; sherman; arthur; developments; process configuration, Industrial Engineering / Manufacturing, Nanotechnology Special Topics, Industrial Engineering / Manufacturing, Nanotechnology Special Topics
- Author(s)
- Cameron, David
- Kääriäinen, Marja-Leena
- Kääriäinen, Tommi
- Sherman, Arthur
- Publisher
- John Wiley and Sons, Inc.
- Publication year
- 2013
- Language
- en
- Edition
- 2
- Page amount
- 272 pages
- Category
- Technology, Energy, Traffic
- Format
- Ebook
- eISBN (ePUB)
- 9781118747384
- Printed ISBN
- 9781118062777